News tagged High-NA EUV at DIGITIMES

NEWS TAGGED HIGH-NA EUV

Thursday 23 July 2026

Intel 18A adopts High-NA EUV in dual-certification push

Intel Foundry has moved high numerical aperture (High-NA) EUV lithography into production on its Intel 18A process, with ASML confirming in a recent press release that Intel is using...

Wednesday 22 July 2026

Albany NanoTech Complex acquires ASML High NA EUV tools for chip research

Parts of ASML's next-generation high numerical aperture (High NA) extreme ultraviolet (EUV) machine have arrived in New York state, where they will be used for chipmaking R&D....

Tuesday 21 July 2026

Samsung keeps High-NA EUV rollout cautious as foundry profitability remains the focus

Samsung Electronics is taking a slower approach than Intel to High-NA extreme ultraviolet (EUV) lithography for advanced chip production,...

Sunday 19 July 2026

ASML supplier Trumpf says South Korea EUV demand is growing faster than Taiwan's

High-NA EUV lithography is becoming the semiconductor equipment industry's next major battleground as demand rises for more advanced chips used in artificial intelligence, high-performance...

Thursday 4 June 2026

TSMC sees no sign of capex slowdown as demand stays strong

TSMC chairman C.C. Wei told shareholders on June 4 that the company sees no reason to cut capital spending, citing strong demand for advanced chips, continuing expansion in the US,...

Friday 22 May 2026

Intel's foundry reset: 14A, 10A and tougher engineering rules

Intel CEO Lip-Bu Tan is reshaping the chipmaker's engineering culture and foundry strategy, confirming that 14A remains on track while revealing that early development has begun on...

Monday 27 April 2026

TSMC's refusal of ASML's expensive High-NA EUV equipment, explained

ASML has launched its 0.55 High Numerical Aperture Extreme Ultraviolet (High-NA EUV) in an effort to extend Moore's Law. The market had originally expected TSMC to adopt it first,...

Thursday 12 March 2026

IBM, Lam Research join forces on sub-1nm logic and High-NA EUV development

IBM and Lam Research have announced a five-year collaboration to develop materials, manufacturing processes, and High-NA EUV lithography...

Wednesday 10 September 2025

SEMICON Taiwan 2025: Zeiss hits milestone of 10 High NA optic systems shipped as TSMC probes future of Hyper NA EUV

At SEMICON Taiwan 2025, Zeiss Semiconductor Manufacturing Technology offered a rare glimpse into the future of extreme ultraviolet (EUV) lithography, outlining its optics roadmap from...

Wednesday 20 August 2025

China unveils e-beam lithography machine with precision near ASML's High-NA EUV, but faces mass production hurdles

China has unveiled its first domestically developed commercial electron-beam lithography (EBL) tool, marking a symbolic step forward in efforts to reduce reliance on foreign semiconductor...

Saturday 16 August 2025

SK Hynix expands EUV in 1c DRAM, launches faster low-power chips for AI PCs

SK Hynix is stepping up its use of extreme ultraviolet (EUV) lithography in next-generation DRAM, increasing the number of EUV layers in...

Thursday 17 July 2025

ASML ships first High-NA EUV tool; Intel takes lead as TSMC, Samsung hold back

ASML posted stronger-than-expected second-quarter 2025 earnings and projected a 15% jump in revenue for 2025 while maintaining a robust gross margin forecast of around 52%. However,...

Friday 27 June 2025

ASML bets on High-NA EUV as Intel, TSMC, Samsung delay mass adoption over cost and risk

ASML, the world's sole provider of extreme ultraviolet (EUV) lithography machines, is pressing ahead with its next-generation High-NA (numerical aperture) EUV systems—even as...

Wednesday 16 April 2025

ASML delivers 46% YoY revenue growth in 1Q, flags margin pressure ahead

ASML, the global leader in semiconductor lithography systems, posted a strong year-over-year revenue gain for the first quarter of 2025, alongside its highest gross margin in over...

Tuesday 18 March 2025

Samsung races to close 2nm gap: first High-NA EUV deployed at Hwaseong

Samsung Electronics reportedly deployed its first high-NA Extreme Ultraviolet (EUV) lithography machine at its Hwaseong Campus in early March. The move represents a key step in Samsung's...

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