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Wednesday 5 November 2008
TSMC to install multiple-beam lithography system in 2009
Taiwan Semiconductor Manufacturing Company (TSMC) is expected to install its first multiple-electron-beam direct write (MEBDW) lithography system for the development of 20nm and more...
Thursday 16 October 2008
SemiLEDs orders multiple lithography systems for LED manufacturing
Ultratec, a supplier of lithography and laser-processing systems used to manufacture semiconductor devices, recently announced it received a multiple-system order from US-based SemiLEDs,...
Tuesday 14 October 2008
Mapper and TSMC sign agreement for multiple e-beam lithography for 22nm node
Mapper Lithography and Taiwan Semiconductor Manufacturing Company (TSMC) have signed an agreement, according to which Mapper will ship its first 300mm multiple-electron-beam maskless...
Thursday 18 September 2008
IBM looks at mathematical techniques to help overcome lithography obstacles at 22nm
In response to ever increasing demands for smaller, more powerful and energy-efficient devices for cloud computing and high-performance servers, IBM has announced the semiconductor...