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China accelerates DUV lithography breakthroughs with patents and testing

Staff reporter, Taipei; Charlene Chen, DIGITIMES Asia 0

Credit: SMEE

China is enhancing its DUV lithography technology amid US export restrictions. Yuliangsheng's 28nm immersion DUV machine is being tested at SMIC, while SMEE has patented a method to improve chip pattern quality.

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