Samsung said to consider Inpria's metal oxide resist for 1c DRAM process

Lin, Chun-yu, Taipei; Judy Lin, DIGITIMES Asia 0

Credit: AFP

Samsung Electronics reportedly intends to use metal oxide resist in the Extreme Ultraviolet (EUV) exposure process of new generation DRAM products. Metal oxide resist belongs to the new generation photoresist, with higher resolution than chemically...

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