Bits + chips
Trusval functional water supply systems adopted for EUV lithography
Jane Wang, Taipei; Adam Hwang, DIGITIMES

Trusval Technology, a Taiwan-based provider of chemical engineering equipment, solution and system integration services, has disclosed its functional water supply systems have been adopted for EUV lithography by semiconductor foundry service providers, with shipments expected to increase in second-half 2020 along with 5nm processes coming into operation.

For semiconductor manufacturing processes, functional water - using mixture of gases and liquids - features capability of removing particles and impurities under the trend of minimizing line width of water to hike wafer cleaning efficiency as well as minimize use of conventional chemicals and reduce power consumption, Trusval said.

Trusval focuses on the Taiwan market currently, with sales of equipment in China accounting for less than 10% of its consolidated revenues. The company has obtained orders for chemical engineering equipment and solutions, including for chemical, slurry, gas supply and waste chemical collection, with shipments scheduled until the second half of 2020.

Trusval posted consolidated revenues of NT$343.7 million (US$11.4 million), gross margin of 7.72%, net operating loss of NT$13.4 million, net loss of NT$5.8 million and net loss per share of NT$0.16 for first-quarter 2020.

Trusval has reported consolidated revenues of NT$105.5 million for April, slipping 15.48% sequentially and 14.30% on year, and those of NT$449.2 million for January-April grew 40.27% on year.

Realtime news
© 2020 DIGITIMES Inc. All rights reserved.
Please do not republish, publicly broadcast or publicly transmit content from this website without written permission from DIGITIMES Inc. Please contact us if you have any questions.