DRAM transition to EUV for sub-10nm node remains a financial challenge

Josephine Lien, Taipei; Jessie Shen, DIGITIMES Asia 1

Major DRAM chipmakers will continue to use multiple patterning exposure techniques for their 1x/1y nodes, but a question mark is still hanging over the prospect of their switch to extreme ultraviolet (EUV) lithography technology for the manufacture...

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