Applied Materials has announced new PECVD film technology to produce higher-performance, high-resolution displays for next-generation tablet PCs and TVs. Available on Applied's AKT-PECVD system, these advanced insulating films enable the use of metal oxide-based transistors that produce smaller, faster-switching pixels to create higher resolution screens, Applied said
Applied's new PECVD films provide a dielectric-layer interface for metal oxide transistors that minimizes hydrogen impurities to improve transistor stability and deliver optimized screen performance. These high-quality silicon oxide (SiO2) films can be deposited by the AKT-PECVD system with precise uniformity on sheets of glass up to nine square meters in size - a capability that is critical to achieving high production yields and low manufacturing costs, Applied stated.
In addition to its new PECVD films, Applied is currently developing advanced PVD solutions, including IGZO deposition, for metal oxide manufacturing. Using its latest rotary cathode array technology, Applied is demonstrating highly-uniform, homogeneous and low-defect, active-layer deposition at higher productivity rates and lower material consumption costs than currently available PVD solutions.
