Bits + chips
Toppan Printing expands photomask process development agreement with IBM to 32nm
Press release, March 8; Rodney Chan, DIGITIMES

Toppan Printing has announced an agreement with IBM to include the joint development of a photomask process for next-generation 32nm semiconductor manufacturing processes in the existing joint development collaboration taking place between the two companies...

The article you are trying to open requires News database subscription. Please sign in if you wish to continue.
Realtime news
© 2019 DIGITIMES Inc. All rights reserved.
Please do not republish, publicly broadcast or publicly transmit content from this website without written permission from DIGITIMES Inc. Please contact us if you have any questions.