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DIGITIMES Insight: TSMC, ASML's 2031 photomask target puts High NA EUV suppliers on the clock

, DIGITIMES Intelligence
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Credit: AFP

ASML and TSMC announced plans in September 2026, ahead of the SPIE BACUS symposium, to advance high-numerical-aperture extreme ultraviolet (High NA EUV) lithography by replacing the decades-old 6-inch photomask format with larger 12-inch masks...

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