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Advantest and Fujitsu to establish JV on e-beam lithography prototypes on 65nm and below

Press release, September 15; Esther Lam, DIGITIMES Asia Friday 15 September 2006 0

Advantest and Fujitsu announced plans to establish a joint venture (JV) to create prototype semiconductors by using electron beam (e-beam) direct lithography on 65nm and 45nm design rules. The companies are currently discussing the terms of a formal...

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