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Nikon to begin volume production of 193nm ArF lithography equipment

Compiled from outside sources by Humphrey Tsai, Research Center; Heidi Chu, DIGITIMES Asia 0

Nikon Precision announced that it plans to begin volume production of a 193nm-wavelength ArF Step and Repeat Scanning System for 0.13-0.15-micron processing in the spring of 2001.

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