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Samsung, SK Hynix eye 2028 High-NA DRAM rollout

, DIGITIMES, Taipei
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ASML's TWINSCAN EXE:5200B High-NA EUV lithography system. Credit: ASML

SK Hynix is targeting 2028 to apply High-NA extreme ultraviolet lithography to DRAM mass production and is considering joining an industry initiative to develop 12-inch photomasks, according to South Korea's fnnews...

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