Home Tech Semiconductors

Rohm and Haas to invest US$60 million in 193nm immersion lithography system

Press release, June 27; Rodney Chan, DIGITIMES Asia Wednesday 27 June 2007 0

Rohm and Haas Electronic Materials will invest US$60 million in leading-edge lithography equipment to support its extensive research and development of advanced 193nm photoresist and anti-reflective coatings used in the manufacture of semiconductor...

The article requires paid subscription. Subscribe Now

Email address

Password

Save my User ID and Password

Save my User ID and Password

Some subscribers prefer to save their log-in information so they do not have to enter their User ID and Password each time they visit the site. To activate this function, check the 'Save my User ID and Password' box in the log-in section. This will save the password on the computer you're using to access the site.

Note: If you choose to use the log-out feature, you will lose your saved information. This means you will be required to log-in the next time you visit our site.

NEW individual users please REGISTER first.

Enterprise user first-time LOGIN.

I forgot my ID and/or password?

MEMBERSHIP BENEFITS