KLA-Tencor has announced the new 2910 series optical wafer defect inspection platform with NanoPoint technology and the new eDR-7100 electron-beam wafer defect review system.
Meeting IC manufacturers' need for accelerated defect sourcing on advanced devices, these two tools combine increased speed with seamless connectivity to find and identify defects that inhibit yield and reliability. The 2910 series' improved defect capture and the eDR-7100's enhanced review resolution have been demonstrated by detecting and imaging unique defects located at the bottom of three-dimensional or vertical pattern structures such as FinFETs.
Multiple 2910 series optical inspection tools, configured as either the 2910 or 2915, and eDR-7100 e-beam review tools have been installed at leading IC manufacturers where they are being used for new technology development and ramp, according to the company.
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