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News tagged CMP
  • Last update: Thursday 10 July 2014 [8 news items]

Applied Materials introduces CVD, CMP systems for 3D architectures

Jul 10, 15:55

Applied Materials has announced two new systems that help customers solve critical challenges in manufacturing high-performance, power-efficient 3D devices.

IC materials firms spend more on R&D, says Dow exec

Sep 10, 12:08

With semiconductor companies constantly upgrading to the latest advanced technologies, related production materials suppliers are required to raise the technological bar and provide...

Hitachi Chemical to build CMP slurry plant in Taiwan

Dec 22, 01:40

Japan-based Hitachi Chemical has unveiled plans to establish a CMP slurry production plant in Tainan, southern Taiwan, with an investment of JPY2 billion (US$25.7 million). The facility...

Pressure to be lifted on rare earth element pricing, says Information Network

Jul 7, 15:27

Manufacturers of a broad spectrum of high-tech products have been feeling the impact of price hikes in rare earth element-based processing materials because of China's embargo in...

CMP slurry set to grow 15% in 2011, says Information Network

Jun 29, 10:43

With a slowdown in IC sales not expected until the third quarter of 2012, demand for slurries to planarize IC surfaces will grow 15% in 2011 on top of a 36% growth in 2010, according...

CMP material startup gains verification from Taiwan foundry

Jan 18, 15:51

Fulltrol Precision Materials, a Taiwan-based startup that makes chemical mechanical planarization (CMP) materials, has obtained certification for its CMP pads from an unspecified...

Kinik obtains certification from TSMC for DDs used in 12-inch wafer CMP

Newswatch - Jan 18, 11:42

Taiwan-based Kinik has secured certification from Taiwan Semiconductor Manufacturing Company (TSMC) for diamond disks (DDs) used in CMP (chemical-mechanical polishing) pad conditioning...

CMP supplier Cabot to acquire Taiwan-based Epoch Material

Dec 23, 11:32

Cabot Microelectronics, a supplier of chemical mechanical planarization (CMP) polishing slurries, has entered into a definitive agreement to acquire the shares of Epoch Material,...

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  • KLA%2DTencor+Surfscan+SP3

    KLA-Tencor Surfscan SP3

    KLA-Tencor has announced a new generation in the Surfscan family of wafer defect and surface quality inspection systems: the Surfscan SP3. As the first unpatterned wafer inspection...

    Photo: Company, Jul 18.

  • Applied+Reflexion+GT

    Applied Reflexion GT

    Applied Materials has launched its Applied Reflexion GT system for advanced metal CMP applications. Key to the new system is its dual-mode architecture, enabling two wafers to be...

    Photo: Company, Dec 4.

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