Sematech to focus on solutions for advanced wafer and mask cleaning at SPCC
Company [Wednesday 16 March 2011]
Sematech has announced that its Surface Preparation and Cleaning Conference (SPCC), the premier technical forum for discussion of the latest innovations in wafer and mask-cleaning technologies, will focus on material and process solutions to key challenges faced by the industry in emerging areas such as III-V materials, 3D TSV technology, MEMS, photovoltaics (PV), environment, safety and health and 450mm. The conference will be held on March 21-23, 2011 at the Sheraton Hotel in Austin, Texas.
Category: Event | Posted: Mar 16, 10:07 | More info