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Applied Materials' new carina system overcomes barriers to etching high-k/metal gates
Photo: Applied Materials [Jul 18, 2007]
Applied Materials' new carina system overcomes barriers to etching high-k/metal gates

Applied Materials announced that it has turned up the heat in etching the world's most advanced transistors with the launch of its Applied Centura Carina etch system.

Using innovative high-temperature technology, the company said this system is the only production-ready solution available today that delivers the material profiles that are essential for scaling logic and memory devices with high-k/metal gates (HK/MG) to 45nm and beyond.

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