Bits + chips
TSMC likely to choose e-beam for next generation lithography tools
Claire Sung, Taipei; Esther Lam, DIGITIMES

In terms of overall cost structure and performance benefits, Taiwan Semiconductor Manufacturing Company (TSMC) will likely adopt electron-beam (e-beam) direct write as its prominent next-generation lithography tools, according to Burn Lin, senior director...

The article you are trying to open requires News database subscription. Please sign in if you wish to continue.
Realtime news
© 2020 DIGITIMES Inc. All rights reserved.
Please do not republish, publicly broadcast or publicly transmit content from this website without written permission from DIGITIMES Inc. Please contact us if you have any questions.