Bits + chips
ASML pushes EUV for sub 22nm lithography
Claire Sun and Esther Lam, DigiTimes.com

ASML has reiterated its positive outlook for extreme ultraviolet (EUV) as the mainstream lithography light source when going to deep submicron production while its closely-tied pure-play foundry partner Taiwan Semiconductor Manufacturing Company (TSMC)...

The article you are trying to open requires News database subscription. Please sign in if you wish to continue.
Realtime news
© 2019 DIGITIMES Inc. All rights reserved.
Please do not republish, publicly broadcast or publicly transmit content from this website without written permission from DIGITIMES Inc. Please contact us if you have any questions.