Bits + chips
TSMC to take delivery of EUV lithography system in 2011, says R&D head
Ingrid Lee, Hsinchu; Jessie Shen, DIGITIMES

Taiwan Semiconductor Manufacturing Company (TSMC) will take delivery of its first extreme ultraviolet (EUV) lithography system from ASML in 2011 paving the way for the company to migrate to a 20nm process in 2013, according to company senior R&D...

The article you are trying to open requires News database subscription. Please sign in if you wish to continue.
Realtime news
© 2019 DIGITIMES Inc. All rights reserved.
Please do not republish, publicly broadcast or publicly transmit content from this website without written permission from DIGITIMES Inc. Please contact us if you have any questions.